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Synopsis

"... These volumes provide the very latest in this critical technology and are an invaluable resource for scientists in both academia and industry concerned with the semiconductor future and all of science."

Foreword by Leonard C Feldman
(Director Institute for Advanced Materials, Devices and Nanotechnology, Rutgers University, USA)

Highlights
  • First comprehensive handbook on instrumentation and techniques for semiconductor nanostructure characterization
  • More than 900 references providing up-to-date information
  • With over 260 illustrations

As we delve more deeply into the physics and chemistry of functional materials and processes, we are inexorably driven to the nanoscale. And nowhere is the development of instrumentation and associated techniques more important to scientific progress than in the area of nanoscience. The dramatic expansion of efforts to peer into nanoscale materials and processes has made it critical to capture and summarize the cutting-edge instrumentation and techniques that have become indispensable for scientific investigation in this arena. This Handbook is a key resource developed for scientists, engineers and advanced graduate students in which eminent scientists present the forefront of instrumentation and techniques for the study of structural, optical and electronic properties of semiconductor nanostructures.

Foreword
Foreword (47k)

Sample Chapter(s)
Introduction (47k)

Contents:
  • Volume 1:
    • Electron Microscopies:
      • Characterization of Semiconductor Nanostructures by Scanning Electron Microscopy (Lynne M Gignac & Oliver C Wells)
      • Transmission Electron Microscopy and Ultra-high Vacuum Transmission Electron Microscopy of Semiconductor Nanostructures (Suneel Kodambaka & Frances M Ross)
      • Aberration Corrected Electron Microscopy (Philip E Batson)
      • Low-Energy Electron Microscopy for Nanoscale Characterization (James B Hannon & Rudolf M Tromp)
      • Ultrafast Microscopy of Plasmon Dynamics in Nanostructured Metal Surfaces (Hrvoje Petek & Atsushi Kubo)
      • X-Ray Diffraction Methods for Studying Strain and Composition in Epitaxial Nanostructured Systems (Angelo Malachias, Raul Freitas, Sérgio L Morelhão, Rogério Magalhães-Paniago, Stefan Kycia & Gilberto Medeiros-Ribeiro)
      • Stress Determination in Semiconductor Nanostructures Using X-Ray Diffraction (Conal E Murry & I Cevdet Noyan)
  • Volume 2:
    • Scanning Probes:
      • An Introduction to Scanning Probe Microscopy of Semiconductors with Case Studies Concerning Gallium Nitride and Related Materials (Rachel Oliver)
      • STM of Self Assembled III-V Nanostructures (Vaishno D Dasika & Rachel S Goldman)
    • Atom and Optical Probes:
      • Atom Probe Tomography for Microelectronics (David J Larson, Ty J Prosa, Dan Lawrence, Brian P Geiser, Clive M Jones & Thomas F Kelly)
      • Raman Spectroscopy of Carbon Nanotubes and Graphene Materials and Devices (Marcus Freitag & James C Tsang)
      • Single Nanowire Photoelectron Spectroscopy (Carlos Aguilar & Richard Haight)
      • Time-Domain Thermoreflectance Measurements for Thermal Property Characterization of Nanostructures (Scott Huxtable)

Readership: Advanced graduate students and professionals in physics, chemistry, materials science and nanoscience.

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